| 言語種別 | 英語 |
|---|---|
| 発行・発表の年月 | 2016 |
| 形態種別 | 学術研究論文 |
| 査読 | 査読あり |
| 標題 | Characterization of Effective Mobility and Its Degradation Mechanism in MoS2 MOSFETs |
| 執筆形態 | 共著 |
| 掲載誌名 | IEEE Transactions on Nanotechnology |
| 掲載区分 | 国外 |
| 巻・号・頁 | 15(4),651-656 |
| 著者・共著者 | Takahiro Mori,Naruki Ninomiya,Toshitaka Kubo,Noriyuki Uchida,Eiichiro Watanabe,Daiju Tsuya,Satoshi Moriyama,Masatoshi Tanaka,Atsushi Ando |
| DOI | 10.1109/TNANO.2016.2570280 |
| Put Code(ORCID) | 33374171 |
| PermalinkURL | http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcAuth=ORCID&SrcApp=OrcidOrg&DestLinkType=FullRecord&DestApp=WOS_CPL&KeyUT=WOS:000380026400011&KeyUID=WOS:000380026400011 |
| researchmap用URL | http://orcid.org/0000-0001-6599-6433 |